Publication date: 15th December 2014
Bismuth vanadate has attracted increasing attention as a metal oxide based photoanode for photoelectrochemical devices, for both, water splitting and CO2 reduction, with a bandgap in the visible range (2.4-2.5eV) and a valence band position close to that of TiO2, which allows a free bias solar water splitting when coupled with an adequate photocathode (Cu2O, Si). Recent efforts on the synthesis by reactive sputtering, as a scalable thin film deposition technique, led to very complicated deposition procedures employing separate targets. In this work, we report an alternative deposition technique based on pulsed laser deposition (PLD) that allows the synthesis of stoichiometric BiVO4 using one single target. Uniform thin film layers up to 4-inch can be obtained with this equipment. Furthermore, an ultrathin TiO2 layer was applied using Atomic Layer Deposition that acts as surface passivation in order to suppress its intrinsic photocorrosion in alkaline media, as well as the deposition of an adequate OER catalyst for water oxidation. Finally, results on free bias hydrogen production will be shown.
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