Proceedings of Materials for Sustainable Development Conference (MAT-SUS) (NFM22)
Publication date: 11th July 2022
Scaling-up chemical procedures for the production of semiconductor nanoparticles (NPs) from batch processes to an industrial relevant scale is not easy, since the media conditions at laboratory are not always compatible with the large scale system in terms of solubility, temperature, pH, safety, etc. [1] What makes a continuous flow method more plausible as a solution for the large-scale production of NPs is the amenability to automatization, parallelization, superior reproducibility and reaction rates, a dramatic reduction on mixing time scales and an homogeneous temperature dispersion across the entire volume reaction. [2] All these advantages over traditional batch scale synthesis lead to a higher control on features such as particle size, particle size distribution and morphology. [3] Among different semiconductor materials, we focused our attention on BiVO4, an n-type semiconductor that has emerged as one of the most promising metal oxides as photoanode for water oxidation. This material is extensively used in photoelectrochemistry since it has a narrow bandgap of 2.4 eV, adequate bands position, low toxicity, earth-abundant composition, low cost and high physical and chemical stability. [4] Moreover, our group designed and studied different methodologies for the preparation of this type of photoelectrodes at laboratory scale. [5]
In this communication, we show the preparation of BiVO4 NPs as a semiconductor material to be used as photoanode in large-area photoelectrochemical devices by using a simple continuous flow system.
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