Metal halide perovskite for X-ray and γ-ray detection
Yadong Xu a b, Bao Xiao a b
a MIIT Key Laboratory of Radiation Detection Materials and Devices
b State Key Laboratory of Solidification Processing, Northwestern Polytechnical University, Xi’an 710072, China
Materials for Sustainable Development Conference (MATSUS)
Proceedings of nanoGe Fall Meeting 2021 (NFM21)
#RadDet21. Radiation Detection Semiconductor Materials, Physics, and Devices
Online, Spain, 2021 October 18th - 22nd
Organizers: Michael Saliba and Mahshid Ahmadi
Invited Speaker, Yadong Xu, presentation 242
DOI: https://doi.org/10.29363/nanoge.nfm.2021.242
Publication date: 23rd September 2021

Here, we report the progress of detector-grade metal halide perovskite and device fabrication for X-ray and gamma-ray detection. For the 3D perovskite, the all-inorganic perovskite CsPbBr3 grown by either solution or melt method demonstrates an energy resolution of ~7% for 5.49 MeV 241Am α particles, while exhibits a good peak discrimination for 59.5 keV 241Am γ-rays. In terms of organic-inorganic hybrid perovskite, solution grown FAPbBr3 resolves 59.5 keV 241Am γ-rays with an energy resolution of 40.1% at room temperature for the first time. To further improve the perovskite stability resulted from the ion migration, dimensional reduction engineering was employed on the 3D perovskite. The 2D hybrid perovskite by incorporating large organic cations into CsPbBr3, the resulting (BDA)CsPb2Br7 detector shows a capability for detecting 5.49 MeV 241Am α-particles with an energy resolution of 37%, while possesses high X-ray sensitivity up to 725.5 μC∙Gy-1∙cm-2 with excellent working stability. Furthermore, we also demonstrate a potential candidate the 0-D perovskite material Cs2TeI6 grown by electrostatic assisted spray (E-spray) deposition, as a sensitive all-inorganic X-ray photoconductor for direct photon-to-current conversion X-Ray detectors. The electrospray apparatus can be readily automated and fully integrated with the existing display systems based on TFT or CMOS, which will help to implement and scale up this device for manufacturing next generation of flat panel X-ray imagers.

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