In-situ metrology for process control and growth kinetics analysis of complex semiconductor materials
Christian Camus a, Christian Kaspari a, Madeleine Justianto a
a LayTec AG, Seesener Straße, 10-13, Berlin, Germany
Materials for Sustainable Development Conference (MATSUS)
Proceedings of nanoGe Fall Meeting 2021 (NFM21)
#PerFun21. Perovskites I: Solar Cells, Lighting, and Related Optoelectronics
Online, Spain, 2021 October 18th - 22nd
Organizers: Eva Unger and Feng Gao
Industry, Christian Camus, presentation 139
DOI: https://doi.org/10.29363/nanoge.nfm.2021.139
Publication date: 23rd September 2021

Multinary semiconconducting / hybrid materials like perovskites are usually deposited in wet-chemical or evaporation processes. Growth kinetics and reaction paths of these deposition methods generally exhibit a high degree of complexity and are influenced by effects such as diffusion, phase transitions and numerous chemical reactions. Due to this complexity, process optimization for these materials usually takes place in a very empirical instead of analytical, knowledge-based manner. Accordingly, the learning curve bears a great potential for further acceleration. Visualizing and modelling the effects underlying growth and deposition is key for an analytical way of optimization, as it provides the base data for modelling and obtaining in-depth understanding of the processes. At the same time, such data, if obtained “in-situ”, can also be used for controlling and automating the deposition process. Optical metrology methods like in-situ reflectance spectroscopy are ideally suited for these purposes. They are directly linked with the absorption properties of the material, which again directly depend on composition, crystallinity and roughness, and they do not influence the deposition process. In order to obtain the best possible in-situ data for a given process, the metrology system needs to be engineered for optimum performance, (choosing the appropriate optical design, wavelength range, resolution and acquisition speed). In this talk we will demonstrate how, with an appropriately designed system, in-situ metrology can be used for visualizing and analyzing the growth kinetics of wet-chemical and evaporation processes. 

Comment: This is supposed to be a sponsor talk

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