Proceedings of nanoGe Fall Meeting 2021 (NFM21)
DOI: https://doi.org/10.29363/nanoge.nfm.2021.107
Publication date: 23rd September 2021
We will present the unique potential and effectiveness of rapid thermal processing (RTP) for overcoming two significant challenges in the development of oxide thin-film photoelectrodes. The first challenge is the need to bypass the normal temperature limit for the most commonly used glass-based F:SnO2 substrates (FTO, ~ 550 °C) in photoelectrochemistry and photovoltaics research. This limit is a problem since many multinary metal oxides require high processing temperatures (to at least ≈ 850 – 1000 °C in ambient pressure) to obtain the desired high density, high crystallinity, and low defect density.1 The second challenge is synthesizing multinary metal oxides that require a narrow range of optimal processing conditions (e.g., temperatures, heating times, and gas environment) in order to avoid undesired phase transformations and impurities segregation. We will show that RTP can overcome the first challenge by flash-heating Ta2O5, TiO2, and WO3 photoelectrodes to 850 °C without damaging the FTO, and the second challenge with the fabrication of ternary α-SnWO4, which recently attracted attention as a potential candidate for solar water oxidation. In both established and promising materials, heating by RTP resulted in superior crystallinity, electronic properties, and performance when compared with conventional furnace heating of similar photoelectrodes, culminating in a new performance record for α-SnWO4 for sulfite oxidation.
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