Proceedings of nanoGe Fall Meeting19 (NFM19)
Publication date: 18th July 2019
Hematite is one of the most popular semiconductor materials in photoelectrochemical water splitting [1]. It has been studied for long years and still does not stop getting attention [2]. The interest lies in the fact that, although the poor charge transport properties, it remains one of the cheapest and most abundant photoanodic materials of all. Different methods has been used to increase its performance such as doping, morphological optimisation and surface treatments with oxygen evolution catalysts (OEC) [2] [3] [4]. According to its light absorption ability, theoretical maximum photocurrent of 12.6 mA cm-2 should be expected.
A systemtic and reproducible nanostructuring could lead to new trends and thus to new information. We are trying to synthesise and characterise deposited hematite electrodes selectively structured via a UV photolithographic method. We believe that the systematic and controlled increase of the roughness at the photoanode surface can offer new insights into the material properties.
Along with the lithographic morphological approach, we are also concerned with easy and scalable ways to synthesise hematite. Doping and OEC surface treatments of hematite photoanodes for enhanced performance are also included.
I would like to thank personally Maximilian Morgenbesser, MSc, for the PLD depositions and UV photolithography, Alexander Viernstein, MSc, for the help XRD and Dektak measurements and Joseph Ring, BSc, for the sputtering depositions.
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