Proceedings of nanoGe Fall Meeting19 (NFM19)
DOI: https://doi.org/10.29363/nanoge.nfm.2019.143
Publication date: 18th July 2019
A new approach for fabricating high-quality ternary photoelectrodes such as CuBi2O4 will be presented. Pulsed laser deposition (PLD)[1] is used to deposit the binary oxides Bi2O3 and CuO on FTO substrates, and rapid thermal processing (RTP)[2] is used to achieve an efficient solid-state reaction between the two oxide films. This study shows that when Bi2O3 is deposited first, phase-pure films of CuBi2O4 are obtained. A comparative study with conventional furnace annealing (FA) reveals the importance of radiative annealing in the processing of complex metal oxides photoelectrodes. Furthermore, the much shorter annealing times allow the use of FTO substrates at temperatures up to 650 °C, also resulting in a low thermal budget (the product of process temperature and processing time at an elevated temperature). The formation mechanism of the CuBi2O4 was studied with a variety of structural, chemical, and optical characterization techniques. The photoelectrochemical properties of the RTP and FA processed photoelectrodes were investigated and compared to other CuBi2O4 electrodes made by other techniques such as spray-pyrolysis[3] or drop-casting.[4] The RTP processed photoelectrodes exhibit improved properties and unprecedented photoelectrochemical stability without the addition of protection layers. Finally, photoelectrochemical H2 production of the RTP processed photoelectrodes is confirmed.
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