Photoelectrodeposition of Amorphous Cobalt and Manganese Oxide Hydroxides onto Fe2WO6 Photoelectrodes
Moritz Kölbach a, Sebastian Fiechter a, Peter Bogdanoff a
a Electrochemistry, Electrocatalysts, Water oxidation, Manganese oxide, Cobalt oxide, Electrodeposition, Solar fuels
Materials for Sustainable Development Conference (MATSUS)
Proceedings of nanoGe Fall Meeting 2018 (NFM18)
S2 Light Driven Water Splitting
Torremolinos, Spain, 2018 October 22nd - 26th
Organizers: Wolfram Jaegermann and Bernhard Kaiser
Poster, Moritz Kölbach, 276
Publication date: 6th July 2018

In the development of photoanodes for light-induced water oxidation it is often essential to deposit a co-catalyst that either passivates surface states at the electrode/electrolyte interface or catalyzes the oxygen evolution reaction (OER). In this contribution we demonstrate the influence of cobalt as well as manganese oxide/hydroxide on semiconducting and photosensitive iron tungstenate Fe2WO6 layers. Thin films of amorphous CoOxOHy and MnOxOHy were deposited on this ternary oxide [1-3], a novel semiconductor with an indirect/direct band gap of 1.7 eV and 2.4 eV. After deposition of a CoOxOHy film on top of the electrode the photocurrent density could be doubled while in case of amorphous MnOxOHy the onset potential under illumination could be shifted by ~250mV. Annealing the electrodes after photoelectrodeposition of MnOxOHy at 500°C, crystalline a‑Mn2O3 is formed. However, after this treatment the photosensitivity of the electrode is completely lost. This behavior can be explained by a reaction of Mn2O3 with Fe2WO6 under formation of a (Fe1-xMnx)2WO6 interface layer acting as a trap for excited charge carrieres. Our results show that the deposition of amorphous co-catalysts on iron tungstenate films can strongly influence its photoelectrochemical performance.

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