Proceedings of nanoGe September Meeting 2017 (NFM17)
Publication date: 20th June 2016
Abstract
Tungsten trioxide (WO3) is a promising material for photo-electrochemical (PEC) water splitting because of its good photoelectron mobility (~12 cm2V-1s-1 at RT), suitable band-gap (2.6-2.8 eV) and good chemical stability [1-3]. The microstructure, chemical states and internal defects play a sensitive in the PEC properties of WO3 [1,3]. In this study, WO3 thin films were grown on FTO-glass substrates by reactive radio frequency (RF) sputtering and by plasma enhanced atomic layer deposition (ALD), respectively. As-deposited films were annealed in a tubular furnace in different atmosphere with different ratios of nitrogen (N2) and oxygen (O2) as well as air. The structural properties were evaluated by XRD, XPS and SEM and photo-electrochemical properties were studied with cyclic voltammetry and electrochemical impedance spectroscopy in 0.5 M H2SO4 electrolyte. The results show that significantly higher photocurrent was obtained for ALD WO3 thin films during PEC water splitting than RF sputtered WO3 films. Moreover, the ALD WO3 films annealed in N2 revealed the best performance of PEC water splitting, while there is no significant difference in the structural and photo-electrochemical properties for RF sputtered WO3 films annealed in different atmosphere. In our presentation, we will relate the structural and chemical properties of the different WO3 thin films with the PEC properties and from this will conclude about how to process and design high performing electrodes for water splitting.
Reference
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