Proceedings of nanoGe September Meeting 2015 (NFM15)
Publication date: 8th June 2015
This presentation will describe colloidal synthetic methods that have been developed for silicon (Si) nanostructures that yield control of size and shape. We have been exploring two routes to the synthesis of Si nanomaterials with quantum-size dimensions: (1) metal-seeded growth of Si nanorods by arrested precipitation and (2) high temperature (>1100oC) solventless decomposition of silicon suboxide (hydrogen silsequioxane, HSQ) to form Si nanocrystals embedded in SiO2 that are processed by etching and ligand passivation. Both routes produce colloidal dispersions of fluorescent Si nanomaterials. The HSQ route produces Si quantum dots that we have been using as model systems to understand effective surface passivation routes to colloidal Si nanomaterials. We have discovered a room temperature hydrosilylation strategy promoted by carboxylic acid or ester functional groups and have demonstrated this for styrene passivation without homogeneous self-polymerization in solution. We have found that thiol passivation of Si quantum dots is possible, but that the monolayer coating is highly susceptible to hydrolysis and degradation in the presence of water. We have also shown that organic chromophores with strong light absorption can be grafted to the nanocrystals to improve fluorescence brightness. The Si quantum dots can also be made with very uniform size and assembled into superlattices. We will show examples of Si quantum dot superlattices in which the nanocrystals exhibit a high degree of crystalline orientational order. In the case of Si nanorods, an effective surface etching and ligand passivation strategy was developed to stabilize the fluorescence of the nanorods. Some comparison of Si quantum dot and quantum rod optical properties will be presented.