Proceedings of MATSUS Spring 2025 Conference (MATSUSSpring25)
DOI: https://doi.org/10.29363/nanoge.matsusspring.2025.529
Publication date: 16th December 2024
We present an isolated plasma soft deposition (IPSD) technique for the plasma damage-free deposition of an amorphous InGaTiO (IGTO) top cathode on semi-transparent perovskite solar cells (PSCs). Unlike conventional DC or RF magnetron sputtering, where plasma directly faces the target, the IPSD process utilizes an isolated plasma region that prevents plasma irradiation, ensuring the deposition of the IGTO cathode without damaging the soft perovskite active layer. The confinement of high-density plasma in isolated regions, achieved through a Nd-Fe-B45 magnet array, further protects the active layer by minimizing the impact of energetic particles from the sputtered IGTO targets. Additionally, linear scanning of the glass substrate within this isolated plasma region enables low-temperature, large-area IGTO deposition. Under optimal conditions, the IPSD-processed IGTO film, with a thickness of 150 nm, exhibited a low sheet resistance of 31 Ω/square, high average optical transmittance of 91.41%, and a work function of 4.1–4.5 eV. To demonstrate the feasibility of this technique, we fabricated semi-transparent PSCs with spin-coated perovskite layers. The PSCs with IPSD-processed IGTO cathodes achieved a power conversion efficiency (PCE) of 17.52%, comparable to the 4.35% PCE of PSCs with magnetron-sputtered ITO cathodes, due to the absence of plasma-induced damage. Furthermore, we successfully integrated the IPSD technique into the fabrication of PSC and Si-based tandem solar cells, achieving PCEs ranging from 24% to 28%. These results highlight the significant potential of the IPSD-based deposition process as a key technology for the commercialization of semi-transparent PSCs and tandem solar cells.
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