Proceedings of MATSUS Spring 2025 Conference (MATSUSSpring25)
DOI: https://doi.org/10.29363/nanoge.matsusspring.2025.200
Publication date: 16th December 2024
In the context of nanocrystal-based optoelectronic devices, the design of photodiodes faces a major challenge related to the design of building blocks as simple as the p-n junction that require some control on the carrier density profile. Gating appears as a possible alternative method [1] to shape the doping profile. The main limitations of the latter are related to the continuous application of DC bias, which increases energy consumption and can be a noise source.
In this work, we develop a general approach to achieve carrier density control by coupling the nanocrystal layer to a ferroelectric material. By utilizing the remnant polarization of the latter, the need for the application of gate bias is eliminated. The idea is to use the up and down change in the ferroelectric polarization to directly form a lateral p-n junction in the nanocrystal film, as has already been achieved for 2D materials.
We start by designing a ferroelectric-NC heterostructure made of Lead Zirconium Titanate (PZT) and HgTe NCs that act as an infrared active spin-coatable ink. The effect of the ferroelectric polarization on the HgTe band offsets is revealed using nano-beam X-ray photoemission microscopy. A photodiode is then built and enhanced photoresponse and reduced noise are obtained thanks to the built-in potential of the diode. [2] We then expand the concept to a large scale substrate using the commercially available periodically poled lithium niobate (PPLN) substrate. [3]