Publication date: 17th February 2025
Physical vapor deposition (PVD) has long been a cornerstone in semiconductor technology, offering advantages such as conformal deposition, precise thickness control, and scalability for applications like thin-film photovoltaics (PV). Among PVD techniques, pulsed laser deposition (PLD) has emerged as a promising yet underexplored approach for the fabrication of metal halide perovskites (MHPs). Recent advancements demonstrate that PLD enables single-source vapor-phase growth with precise stoichiometry control, achieving single-junction solar cell efficiencies exceeding 19%.1PLD’s ability to control film thickness and deposition rates further allows for the epitaxial growth of halide perovskites on lattice-matched substrates, highlighting its potential for high-performance optoelectronic devices.2 This work discusses the latest developments in PLD for MHPs, spanning from mechanosynthesis of perovskite precursors to controlled thin-film growth, solar cell integration and opportunities beyond solar. We address key challenges of PVD methods for MHPs such as high deposition rates, which can be leverage for one-step growth of perovskites, or even for rapid deposition of the inorganic components for the fabrication of MHP via the hybrid route for tandem devices. We will furthermore discuss opportunities for advancing other PVD methods based on learnings from PLD, towards scalable and versatile PVD methods for next-generation optoelectronic technologies.
References
https://doi.org/10.1016/j.joule.2024.09.001
https://doi.org/10.1038/s44160-024-00717-z
European Research Council (ERC) under the European Union’s Horizon 2020 Research and Innovation Program (CREATE, grant agreement no. 852722)
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