Publication date: 13th July 2024
Optical lithography has been the key enabler for scaling feature sizes of integrated circuits, allowing the exponential growth of the semiconductor industry. Traditional photolithography involves the use of a photomask and a mask aligner to transfer the desired pattern onto a wafer. An alternative method is maskless lithography, in which the pattern is directly exposed onto the substrate surface using a light sensitizer such as a laser. For many applications this is preferred as it allows to circumvent the lengthy process of designing and manufacturing a photomask to transfer the desired pattern onto the wafer.
Herein we develop a custom-made laser writer lithography system based on a motorized micro-photoluminescence setup with which various micro – patterns, such us arrays of pixels, dots, waveguides etc. are transferred onto CsPbBr3 nanocrystal (NC) films deposited on silicon substrates. The structural and optical properties of the patterned NCs are investigated with a combination of atomic force microscopy (AFM), near-field scanning optical microscopy (NSOM) and hyperspectral photoluminescence mapping experiments. Such patterned NC solids can evolve into functional building blocks for solution-processed micro-scale photonic circuits and devices.
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